High-k Metal Gate Approaches
VeraFlex II – Addressing Gate First and Replacement Gate Processes
Two approaches have emerged for high-k metal gate (HKMG) applications – gate first and replacement gate. ReVera’s VeraFlex platform has proven itself a key enabler in the development and pilot production of both of these HKMG technologies. Now, as the focus shifts to production, customers are finding that traditional production metrology approaches are ineffective, too costly and too complicated to implement.
ReVera addresses the challenges for HKMG production metrology with the VeraFlex II, a high productivity system designed for volume HKMG production, and built on the established performance of our VeraFlex platform.
Overview of HKMG Approaches
Proponents of both the gate first and replacement gate processes claim various advantages. In addition, the selection of the appropriate process relies on many additional factors, such as the capabilities of your process development organization and the focus of your manufacturing operation. Regardless of the approach taken, VeraFlex II is a critical component in supporting your productions processes, providing measurement and in-line control of the complex high-k, work function and metal gate materials systems. An overview of the approaches is provided at the links below:
Contact ReVera to discuss your specific high-k challenges, and the advantages of the VeraFlex II production metrology system to your production processes.