ReVera, Inc.

ReVera’s materials metrology systems provide flexible solutions for critical problems.


Example 1 Optimized HfSiON Film

Example 2 DRAM TiN Electrode

Example 3 Flash Memory N-bonding

Example 4 High K Capacitor

Example 5 Multilayer Electrode Films

Applications Solutions

ReVera systems’ capabilities combine to measure, monitor, and control critical material properties for 65nm, 45nm and beyond.

Example 4: High K Capacitor

Problem Control a multilayer ALD film: HfOx – AlOx – SiOx.
ReVera Solution Utilize thickness, composition and interface quality capabilities to control thickness, SiO interface and composition.