ReVera, Inc.

ReVera’s materials metrology systems provide flexible solutions for critical problems.


Example 1 Optimized HfSiON Film

Example 2 DRAM TiN Electrode

Example 3 Flash Memory N-bonding

Example 4 High K Capacitor

Example 5 Multilayer Electrode Films

Applications Solutions

ReVera systems’ capabilities combine to measure, monitor, and control critical material properties for 65nm, 45nm and beyond.

Example 5: Multilayer Electrode Films

Problem TiN forms defects in certain composition states, and contamination from process leads to yield loss.
ReVera Solution Utilize thickness, composition and surface condition capabilities to control Ti/N ratio and Al%, and to monitor for C, Cl, F.