Articles
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Process monitoring and surface characterization with in-line XPS metrology N. Cabuil, A. Le Gouil, O. Doclot, B. Dickson, A. Lagha, M. Aminpur, C. Chaton, J-C. Royer Solid-State Technology, October 2007 |
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Pattern Wafer XPS Metrology for Advanced Process Control John A. Samuels, Ph.D Presented at “Advances in E-Mfg., Metrology & Process Control” Device Scaling TechXPOT, SEMICON WEST, July 18, 2007 |
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Using an XPS-based metrology system to determine film thickness and composition C. Thomas Larson, Emir Gurer, and J. Kelly Truman MICRO Magazine, April 2005 |
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In-Line Compositional and Thickness Metrology Using XPS for Ultra-Thin Dielectric Films J. Kelly Truman, Emir Gurer, C. Thomas Larson, David Reed Proceedings of the Characterization & Metrology for ULSI Technology Conference, Richardson, Texas, March, 2005 |
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Meeting challenges for engineering the gate stack J. Borland, J.O.B. Technologies; E. Gurer, ReVera Inc.; M. Benjamin, Solid State Measurements Inc.; W. Skinner, Epion Corp.; T. Seidel, Genus Inc.; M. Schumacher, Aixtron AG Solid State Technology, July, 2005 |